Nano-gatiau stensil

Mae haenau nanoscale (e . g ., teflon, carbid silicon) yn gwella rhyddhau past sodr trwy leihau egni wyneb i 15-20 mn/m {. haenau atal pastio clogio i mewn<0.3mm pitch components, improving transfer efficiency by 30%. Durability exceeds 100,000 prints without degradation. Application methods include plasma-enhanced CVD and electrospray. Benefits: Reduced bridging in QFN packages, elimination of manual wiping downtime. Testing confirms >Mae cyfradd llenwi agorfa 95% ar gyfer cyfyngiadau cydrannau 01005 . yn cynnwys gofynion unffurfiaeth cotio o dan drwch 50nm .